Cleaning EXPEDIUS™ Series
Cost effective batch cleaning system for a long term with recognized by semiconductor manufacturing industry

The EXPEDIUS™ series is the state-of-the-art cost effective 300mm wafer cleaning system that enables 50 wafers maximum processing in one batch with multiple bath for various chemicals. EXPEDIUS™ supports not only conventional wet processes such as pre-diffusion/oxidation clean, post-etch clean and resist stripping but also includes newly developed unique functions to realize highly selective wet etch of Oxide/Nitride for 3D NAND device manufacturing with a smaller system footprint and superior productivity.
Product comparison
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Wafer size (mm) |
300 |
Availability | New |
Throughput (wph) |
1000 |
Process | Pre/Post clean, Wet etch, PR strip |
Substrates | Si |
Dry method | New SD2 |
EXPEDIUS is a registered trademarks or trademarks of Tokyo Electron Group in Japan and/or other countries.