Launched in 2020, the Episode™ UL series of etch systems can be configured flexibly with up to 12 chambers. Featuring reductions in footprint, ease of maintenance, and TEL’s proprietary smart tool technology, Episode™ UL significantly boosts customers’ fab productivity. Its combination of excellent process performance and high productivity supports diversifying functions of semiconductor devices and accelerates their evolution.
Episode™ UL
Designed to boost TEL customers’ fab productivity, Episode™ UL offers many advantages including flexible multi-chamber configurations, significant saving in footprint, ease of maintenance, and advanced Smart tool features.
TEL is the pioneer of space-saving systems with a rectangular cluster design, in which processing chambers are arranged in two horizontally opposed rows. Episode™ UL can flexibly accommodate between 4 and 12 chambers to maximize loading capacity based on customer fab layouts. With a maximum 12 chambers configuration, the new platform’s horizontally opposed cluster design offers significant reduction in footprint per chamber for both cleanroom and utility areas. Episode™ UL also has a larger space for easier maintenance than that of its predecessors, ensuring greater ease of maintenance. Its transfer system and process modules are equipped with a number of sensors and high-speed control systems, enabling autonomous process control via big data analytics powered by TEL’s proprietary smart tool technology.
Episode™ UL offers higher process performance and extendability to drive the evolution of the latest logic and memory devices.
Please use the following link to watch promotion video of TEL Episode™ UL.
URL: https://youtu.be/wHeXV70whAs
Flexible Layout
Space Saving
Smart Tool
 |  |  | |
| Episode™ UL | Tactras™ | Certas™ LEAGA™ | |
|---|---|---|---|
| Wafer size (mm) | 300 | 300 | 300 |
| Availability | New | New | New |
| Number of chambers | 1-12 | 1-6 | 1-6 |
| Application | Dielectric, Conductor, Reactive Ion Etch | Dielectric, Conductor, Reactive Ion Etch | Dielectric, Chemical Dry Etch |
| Substrates | Si | Si | Si |
| Safety | S2, CE | S2, CE | S2, CE |
Episode, Tactras, Certas and Certas LEAGA are registered trademarks or trademarks of Tokyo Electron Limited in Japan and/or other countries.
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