ANTARES™ is a series of a fully automated, single-wafer, CryoKinetic systems used for processing 200/300mm wafers. Each system uses cryogenic aerosol technology to safely remove nanoscale particles from device surfaces. Unlike conventional wet technologies, this all-dry process reduces defects without damaging the wafer surface, even on metal and low-k films. ANTARES™ series enables proven yield enhancing defect removal with no corrosion of metals, no watermarks on hydrophobic surfaces, and no wafer charging. The process is suitable for all materials.
