Tokyo Electron Releases EVAROS™, a Batch Thermal Processing System for 300 mm Wafers

Tokyo Electron (TEL; Head Office: Minato-ku, Tokyo; President: Toshiki Kawai) has announced the release of EVAROS™, a batch thermal processing system for 300 mm wafers.

As the development of complex 3D-structured semiconductor devices progresses, there is a growing demand for deposition systems with sophisticated control capabilities. Better power-saving performance is required for environmental benefits, along with improved chip production efficiency. To meet these needs, TEL is releasing a next-generation batch thermal processing system that offers advanced functionality and high productivity.

EVAROS™ can process up to 200 wafers at a time, surpassing the capacity of our previous 300 mm wafer models. With its improved wafer transfer speeds, the system offers superior productivity. The thermal control unit, which is a critical component of a batch thermal processing system, features a newly developed multi-zone control heater with enhanced dynamic fidelity, response, and stability characteristics. This ensures excellent heating uniformity and significantly reduces the time needed to raise, lower, or stabilize the temperature. The adoption of large-diameter exhaust ducts has produced exceptional conductance^*1 characteristics, enabling the high precision and quality of deposition control required for ALD^*2 and other processes used to manufacture advanced devices.

In terms of the environmental impact, the system reduces utility consumption, including electricity, cooling water, and gas. As a result, it produces approximately 25% fewer CO2 emissions per wafer than with the previous TELINDY PLUS™ . The wafer carrier’s automatic position adjustment feature speeds up system installation and facilitates maintenance. Additionally, the newly introduced system controller will support many autonomous functions in the future.

“EVAROS™ represents a major evolution in batch thermal processing systems, a field where we have cultivated basic technologies for many years,” said Shigeki Nakatani, Vice President & General Manager, TFF BU. “The system provides superior productivity and environmental performance for ALD and other deposition processes that require precise control. We will continue to advance our technologies and expand our application processes to meet the diverse needs of our customers.”

EVAROS and TELINDY PLUS are registered trademarks or trademarks of Tokyo Electron Group in Japan and/or other countries.

Conductance: A measure of how easily exhaust gases flow

ALD: Atomic Layer Deposition