Must See for Process Engineers: SPIE Advanced Lithography + Patterning 2023
Event Summary
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Date
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2023.02.26 - 2023.03.02
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Location
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United States（San Jose）
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Target
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Process Engineer
The SPIE Advanced Lithography will be held form February 26 to March 2, 2023 at San Jose, California, United States. This event will focus on EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. Tokyo Electron (TEL) is working on scaling by utilizing advantage of its wide lineup of semiconductor production equipment such as Coater/Develop. In this event we will make presentations on these latest research. Join and inspired at the conference as watching a great presentation from TEL!
Experts address a variety of technologies and applications:
Extreme ultraviolet (EUV) lithography
Novel patterning technologies: semiconductors, MEMS, NEMS, MOEMS
Metrology, inspection, and process control for microlithography
Advances in patterning materials and processes; optical microlithography
Design-process-technology co-optimization for manufacturability
Advanced etch technology and process integration for nanopatterning
