A must-see for all process engineers! The 22nd International Vacuum Congress (IVC-22)
Event Summary
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Date
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2022.09.11 - 2022.09.16
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Location
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Sapporo Convention Center / virtual conference
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Target
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Process Engineer
The 22nd International Vacuum Congress (IVC-22) will be held virtually on September 11-16 at Sapporo city, Japan.
The conference will be attended by world-renowned researchers in the fields of vacuum and surface science, people who are active on the front lines of business utilizing technologies in their respective fields, and students engaged in research, who will present and discuss their research on vacuum science and technology, plasma science and engineering, thin films, surface science and technology, and more.
Tokyo Electron (TEL) and Fukuoka University will co-author two presentations on these technologies, which is also used in semiconductor manufacturing processes. We look forward to seeing you there!
IR Spectroscopic Study of Film Deposition Process during Acetylene Plasma
T. Nakai*1, A. Kuwada*1, R. Sasamoto*1, M. Shinohara*2, T. Matsumoto*3, S. Tanaka*3
1 Graduate School of Engineering, Fukuoka University
2 Department of Electrical Engineering, Fukuoka University
3 Tokyo Electron Technology Solutions Ltd.
Effect of Helium as Diluting Gas on Film Deposition Process during Acetylene Plasma
A. Kuwada*1, T. Nakai*1, R. Sasamoto*1, M. Shinohara*2, T. Matsumoto*3, S. Tanaka*3
1 Graduate school of engineering, Fukuoka University
2 Department of Electrical Engineering, Fukuoka University
3 Tokyo Electron Technology Solutions Ltd.
IUVSTA - Elsevier Student Award winner!
A. Kuwada
Graduate school of engineering, Fukuoka University
