ASD2021
Event Summary
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Date
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2021.04.06 - 2021.04.08
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Location
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virtual conference
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Target
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Process Engineer
Tokyo Electron (TEL) is proud of to be a sponsor of the 5th Area Selective Deposition Workshop (ASD 2021) will be held virtually on April 6-8. The area selective deposition (ASD) is one of the key technology for scaling. In this event, latest researches and challenges regarding ASD will be discussed. TEL and collaborators will give a presentation on self-assembled monolayer (SAM) for ASD. We would be happy if you could attend!
InvitedSpin-on of Self-assembled monolayers (SAMs) for enabling area selective deposition (ASD)
A. Romo-Negreira *1, S. Armini *2, A. Viva *2, K. Nafus *1, M. Muramatsu *1, K. Takahiro *1
1 Tokyo Electron Kyushu Ltd.,
2 imec
Analysis of Reaction and Decomposition of Isopropyl Alcohol on Copper and Copper Oxide Surfaces Toward Area-selective Processes
T. Mawaki *1, A. Teramoto *2, K. Ishii *3, Y. Shiba *1, T. Suwa *1, S. Azumo *3, A. Shimizu *3, K. Umezawa *3, R. Kuroda *1, Y. Shirai *1, S. Sugawa *1
1 Tohoku University
2 Hiroshima University
3 Tokyo Electron Technology Solutions Ltd.
