SPIE. Photomask Technology + EUV Lithography Digital Forum 2020
Event Summary
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Date
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2020.09.21 - 2020.09.25
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Location
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virtual conference
SPIE. Photomask Technology + EUV Lithography Digital Forum 2020 will be held as an online virtual conference, on September 21-25. The forum will focus on the photomask technology and the lithography such as EUVL. Tokyo Electron(TEL) will have the honor of participating in a report titled “Improvement of EUV processes for high volume manufacturing”. You can participate in this Digital Forum for free! For additional information, please visit the related link.
Invited paperImprovement of EUV processes for high volume manufacturing
M. Muramatsu, H. Tadatomo, T. Onitsuka, K. Yoshida, A. Dauendorffer, T. Shiozawa, S. Okada, S. Kawakami, S. Shimura (Tokyo Electron Kyushu Limited）
