ALD/ALE 2021
Event Summary
-
Date
-
2021.06.27 - 2021.06.30
-
Location
-
virtual conference
-
Target
-
Process Engineer
The 21st International Conference on Atomic Layer Deposition (ALD 2020) featuring the 8th International Atomic Layer Etching Workshop (ALE 2020) will be held virtually on June 27-30. The latest research on ALD and ALE, which are important technologies for scaling of semiconductor devices, will be presented. Tokyo Electron (TEL) and collaborators will give four research results, including an invited talk. We very much hope you will be able to join us for this event!
The event will feature:
・Live Tutorial Session with live Q&A Chat Opportunities (Sunday, June 27, 2021)
・Live Plenary, Awards, and Student Finalists with live Q&A Chat Opportunities (Monday, June 28, 2021)
・Live Parallel Technical Sessions with live Q&A Chat Opportunities (Tuesday-Wednesday, June 29-30, 2021)
・On Demand Oral Sessions (Starting Monday, June 28, 2021)
・On Demand Poster Sessions with a Mix of Pre-recorded (Video or Audio) Talks and/or PDF files
InvitedAtomic Scale Profile Control in Fine Pitch Patterning and High Aspect Ratio Contact Hole Etching
T. Nishizuka, S. Kumakura, T. Katsunuma, Y. Kihara, M. Honda,
Tokyo Electron Miyagi, Ltd.
Cryo-ALE of silicon based materials
J. Nos, G. Antoun, T. Tillocher, P. Lefaucheux,
GREMI CNRS/Université d'Orléans, France
J. Faguet,
Tokyo Electron America Inc.
K. Maekawa,
TEL Technology Center America, LLC.
R. Dussart,
GREMI CNRS/Université d'Orléans, France
Nanoscale Cryogenic Process for Highly Selective Etch of Si3N4 Over Si
Gaelle Antoun, T. Tillocher, P. Lefaucheux,
GREMI CNRS/Université d'Orléans, France
A. Girard,
IMN CNRS/Université de Nantes, France
C. Cardinaud,
IMN CNRS/Université de Nantes, France
J. Faguet,
Tokyo Electron America Inc.
K. Maekawa, D. Zhang, H. Kim, M. Wang,
TEL Technology Center, America, LLC
R. Dussart,
GREMI CNRS/Université d'Orléans, France 6 GREMI CNRS/Université d'Orléans, France
