SPIE Photomask Technology + Extreme Ultraviolet Lithography 2025
Event Summary
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Date
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2025.09.22 - 2025.09.25
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Location
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Monterey, CA
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Target
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Process Engineer
SPIE Photomask Technology + Extreme Ultraviolet Lithography 2025 will be held from September 22 to 25, in Monterey, California, USA! This conference focuses on semiconductor manufacturing, EUV lithography, patterning technologies, metrology, and process integration. Tokyo Electron (TEL) is advancing scaling technologies by leveraging its wide lineup of semiconductor production equipment, including Coater/Developer.
TEL will present five papers at the conference, including several co-authored works showcasing the latest research achievements! Additionally, Jennifer Church will appear as a Featured Speaker at the Women in Optics Networking Lunch.
Please look forward to this valuable networking opportunity!
◆Women in Optics Networking Lunch
24 September 2025 • 12:00 PM - 1:00 PM PDT | Monterey Conf. Ctr., Colton 3
Connect with other women in the semiconductor industry over an informal networking lunch. Gain insights from our featured speakers as they share their career journeys and offer valuable advice to support your professional growth in this dynamic field.
Featured Speakers
Vicky Philipsen (imec)
Anna Tchikoulaeva (Lasertec)
Indira Seshadri (IBM)
Jennifer Church (TEL)
◆Presentations with co-authors
Optimization of contact hole printability in high-NA EUV
22 September 2025 • 4:50 PM - 5:05 PM PDT | Monterey Conf. Ctr., Steinbeck 3
Coater/developer-based patterning process techniques to achieve tight pitches towards high numerical aperture extreme ultraviolet lithography
22 September 2025 • 6:00 PM - 7:30 PM PDT | Monterey Marriott, San Carlos III/IV
A holistic approach to extending resist material viability in extreme ultraviolet lithography
22 September 2025 • 6:00 PM - 7:30 PM PDT | Monterey Marriott, San Carlos III/IV
Fabrication feasibility of high-quality SRG waveguides for augmented reality applications
24 September 2025 • 2:05 PM - 2:20 PM PDT | Monterey Conf. Ctr., Steinbeck 2
Computationally guided formulation of advanced developers for EUV resists
25 September 2025 • 9:20 AM - 9:35 AM PDT | Monterey Conf. Ctr., Steinbeck 3
