SPIE Photomask Technology + Extreme Ultraviolet Lithography

Where is chip manufacturing going?
If you would like to know what new technology contributes to the angstrom era, you must see this conference.

The International Conference on Extreme Ultraviolet Lithography 2024 will be held on September 30th – October 3rd at the Monterey Conference Center, California, USA! Tokyo Electron (TEL), nearly 100% market share owner of Coater/Developer for EUV lithography space, will give three presentations with partners such as imec, Osaka University, and SANKEN. Join us and learn more!
#TechnologyEnablingLife

Presentations
1 October 2024 • 9:15 AM - 9:30 AM PDT | Monterey Conf. Ctr., Steinbeck 3
Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrology
Shubhankar Das1, Victor M. Blanco Carballo1, Bappaditya Dey1, Xiang Liu2, Christopher Catano3, Guillaume Schelcher1, Danilo De Simone1
1.imec
2.Tokyo Electron Europe Ltd.
3.TEL Technology Center., America, LLC

2 October 2024 • 2:40 PM - 2:55 PM PDT | Monterey Conf. Ctr., Steinbeck 3
Development kinetics analysis based on frequency and impedance changes measured with quartz crystal microbalance method
Yuqing Jin1, Yuko Tsutsui Ito2, Takahiro Kozawa2, Takashi Hasebe3, Kazuo Sakamoto3, Muramatsu Makoto3
1.Osaka Univ.
2.SANKEN, Osaka Univ.
3.Tokyo Electron Kyushu Ltd.

3 October 2024 • 11:45 AM - 12:00 PM PDT | Monterey Conf. Ctr., Steinbeck 3
Novel lithography process for enhanced high numerical aperture EUV patterning performance
Yuhei Kuwahara1, Soichiro Okada1, Satoru Shimura1, Kathleen Nafus2, Philippe Foubert3
1.Tokyo Electron Kyushu Ltd.
2.Tokyo Electron America, Inc.
3.imec