SPIE Advanced Lithography + Patterning 2024
Event Summary
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Date
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2024.02.26 - 2024.02.29
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Location
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United States（San Jose）
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Target
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Process Engineer
“SPIE Advanced Lithography + Patterning 2024” was held from February 25 to 29, 2024 in San Jose, California, United States. This event focused on EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
Tokyo Electron (TEL) is working on scaling by utilizing the advantages of its wide lineup of semiconductor production equipment such as Coater/Develop. In this event, we made 13 presentations about the latest research, including co-authored projects with our partners.
