Must see for Process Engineers! Next Generation Lithography Workshop 2023
2023.07.06 - 2023.07.07
Tokyo Tech Front
Next Generation Lithography Workshop 2023 will be held on July 6-7. The conference will focus on the lithography technologies such as semiconductor production equipment, processes technology, and materials. This is also an opportunity to learn about keywords deeply related to semiconductor innovation, such as EUV lithography (EUVL), High NA EUV Patterning, and Directed Self-Assembly lithography. In addition to TEL's process technology for Coater/Developer in lithography process, for which TEL has the world's No. 1 market share, we will be presenting an invited talk and co-authoring a presentation on comprehensive patterning solutions, including etch processes. We look forward to seeing you there!
Challenges and Solutions for High Resolution Patternig by High NA EUV Lithography
S. Nagahara1, C. Que Dinh2, A. Thiam3, A Dauendorffer2, Y. Kuwahara2, S. Okada2, S. Kawakami2, S. Fujimoto2, M. Muramatsu2, S. Shimura2, Y. Feurprier3, R. Ramaneti3, A. Tsuboi1, K. Nafus4, H. Iida1, T. Miyamoto2, E. Liu5, L. Huli5, K. Kato5, S. Grzeskowiak5
1 Tokyo Electron Ltd.
2 Tokyo Electron Kyushu Ltd.
3 Tokyo Electron Europe Ltd.
4 Tokyo Electron America, Inc.
5 TEL Technology Center, America, LLC
Formation and scalability of fine hole pattern by DSA
M. Muramatsu1, T. Nishi1, K. Ito2, Y. Takahashi2, Y. Hatamura2, T. Kitano3, T. Iwaki4
1 Tokyo Electron Kyushu Ltd.
2 Tokyo Electron Miyagi Ltd.
3 Tokyo Electron Ltd.