A must-see for process engineers! ≪Students: attend for free≫ SPIE Photomask Technology + Extreme Ultraviolet Lithography
Event Summary
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Date
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2022.09.11 - 2022.09.16
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Location
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United States（Monterey）
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Target
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Process Engineer
SPIE Photomask Technology + Extreme Ultraviolet Lithography, one of the leading international conferences that holds the key to technological innovation through semiconductor miniaturization, will be held from September 25 to 29!
Make plans to join the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies. Tokyo Electron (TEL) will give 2 papers, including co-authored projects.
Free to attend for students. We hope that this would be a great opportunity to learn alongside the experts, explore the semiconductor industry, and network with notable professionals!
