A must-see for all process engineers! NGL Workshop 2021

Next Generation Lithography Workshop 2022 will be held virtually on July 7-8. The conference will focus on the lithographic technologies such as semiconductor production equipment, processes technology, and materials.
This is also an opportunity to learn about keywords deeply related to semiconductor innovation, such as EUV lithography (EUVL), High NA EUV Patterning, and Directed Self-Assembly lithography. Tokyo Electron Limited (TEL) will give two oral presentations and one poster presentation (co-authored with imec) in addition to a plenary presentation by the former Chairman, President & CEO of TEL.
As announced in June 2021 in the press release titled "Tokyo Electron to Collaborate with imec-ASML Joint High NA EUV Research Laboratory", TEL will collaborate with imec-ASML to develop a new high NA EUV lithography technology that will enable the development of a new generation of semiconductor manufacturing equipment for multiple consecutive processes. By leveraging the strength of our product lineup, TEL is forming a partnership with resist materials suppliers to provide comprehensive patterning solutions covering etch processes as well as Coater/Developer for lithography processes through our global collaboration.