Etch Systems

Tactras is the latest etching system and is capable of the continuous vacuum transfer of 300-mm wafers. It saves energy and has achieved footprint reduction and throughput improvement equivalent to and greater than the Telius SP. It can also support up to 6 process chambers and possesses superior scalability and productivity.

Features

Can be fitted with Vigus, Vesta, RLSA, UD, and FAVIAS chambers
Supports up to 6 chambers
Achieves high throughput, compact design, and low CoO
Ease of maintenance

Applications

High-aspect ratio contact, capacitor
Mask for double patterning
Low-k dual damascene
*
Tactras, Telius, Vigus, Vesta, RLSA and FAVIAS are registered trademarks or trademarks of Tokyo Electron Limited in Japan and/or other countries.

Semiconductor Production Equipment : Etch Systems

Products

  • Semiconductor Production Equipment
    • Thermal Processing
    • Coater/Developers
    • Etch Systems
    • Surface Preparation Systems
    • Single Wafer Deposition
    • Test Systems
    • Wafer Bonding/Debonding
    • SiC Epitaxial CVD System
    • Gas Cluster Ion Beam System
  • Flat Panel Display Equipment
    • FPD Coater/Developers
    • FPD Etch/Ash Systems
  • Photovoltaic panel (PV) production equipment
  • Field Solutions
  • Electronic Components
  • Chip Making Process