The CLEAN TRACK ACT 12 and ACT 8 are coater/developer that support 300-mm/200-mm wafer processing. They enable stable, high-level processing and smooth development from R&D through to mass production. During in-line processing, the footprint can be reduced to a size equivalent to existing systems, while high-speed transport accomplishes a high throughput. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. In addition, a chemical filter and a high-accuracy oven are used to support DUV processing.


Supports 120 WPH ( wafer per hour ) throughput
Supports 300-mm (200-mm) factory automation
In-line metrology options
Performs recipe management, reliability monitoring, and data analysis (options) remotely from a group controller.


Dry lithography process (ArF, KrF, i-line)
CLEAN TRACK ACT is a registered trademark or a trademark of Tokyo Electron Limited in Japan and/or other countries.


  • Semiconductor Production Equipment
    • Thermal Processing
    • Coater/Developers
    • Etch system
    • Surface Preparation system
    • Single Wafer Deposition
    • Test system
    • Wafer Bonding/Debonding
    • SiC Epitaxial CVD System
    • Gas Cluster Ion Beam System
    • Advanced Packaging
  • Flat Panel Display Equipment
    • FPD Coater/Developer
    • FPD Etch/Ash system
    • Inkjet printing system for manufacturing OLED panels
  • Field Solutions
  • Chip Making Process