Coater/Developers

The CLEAN TRACK ACT 12 and ACT 8 are coater/developers that support 300-mm/200-mm wafer processing. They enable stable, high-level processing and smooth development from R&D through to mass production. During in-line processing, the footprint can be reduced to a size equivalent to existing systems, while high-speed transport accomplishes a high throughput. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. In addition, a chemical filter and a high-accuracy oven are used to support DUV processing.

Features

Supports 120 WPH ( wafer per hour ) throughput
Supports 300-mm (200-mm) factory automation
In-line metrology options
Performs recipe management, reliability monitoring, and data analysis (options) remotely from a group controller.

Applications

Dry lithography process (ArF, KrF, i-line)
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CLEAN TRACK ACT is a registered trademark or a trademark of Tokyo Electron Limited in Japan and/or other countries.

Products

  • Semiconductor Production Equipment
    • Thermal Processing
    • Coater/Developers
    • Etch Systems
    • Surface Preparation Systems
    • Single Wafer Deposition
    • Test Systems
    • Wafer Bonding/Debonding
    • SiC Epitaxial CVD System
    • Gas Cluster Ion Beam System
    • Advanced Packaging
  • Flat Panel Display Equipment
    • FPD Coater/Developers
    • FPD Etch/Ash Systems
  • Field Solutions
  • Electronic Components
  • Chip Making Process