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How Semiconductor is made

08
Isolation Formation

Dielectric Film Formation

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An oxide layer is deposited on the surface to form a dielectric film using a CVD system or a coater that spin-coats liquid materials.

Semiconductor equipment

Dielectric Film Deposition System (Coater, Plasma CVD)
09
Isolation Formation

Planarization

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The unevenly deposited film surface is polished and planarized.

Semiconductor equipment

Gas Chemical Etch/Cleaning System
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