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How Semiconductor is made

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Silicon Substrate

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Monocrystalline silicon ingots are sliced into wafers for ease of processing in the subsequent chip manufacturing steps.

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Oxidation and Nitride Film Deposition

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A wafer is set in a thermal processing system, and then exposed to oxygen at high temperatures to create a layer of silicon oxide on the surface. Next, silane and ammonia gases are introduced in the chamber, forming a silicon nitride top layer by chemical vapor deposition (CVD).

Semiconductor equipment

Oxidation Furnace, Nitriding Furnace Nidride LPCVD
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