NGL Workshop 2021
Event Summary
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Date
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2021.07.08 - 2021.07.09
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Location
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virtual conference
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Target
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Process Engineer
Next Generation Lithography Workshop 2021 will be held virtually on July 8-9. The conference will focus on the lithographic technologies such as equipment, processes, and materials. Tokyo Electron (TEL) will give two oral presentations and three poster presentations.
Oral-1
Self-Aligned Double Pattern Process using PS-b-PMMA DSA pattern
Oral-2
EUV patterning process development
Oral-1
M. Muramatsu *1, T. Nishi *1, Y. Ido *1, T. Kitano *2
1. Tokyo Electron Kyushu Ltd.
2. Tokyo Electron Ltd.
Oral-2
A.Sonoda
Tokyo Electron Ltd.
Poster-1
Enabling EUV pattern transfer by optimized under layer
Poster-2
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography
Poster-3
EUV defect reduction activities using coater/developer and etching technique
Poster-1
S. Okada
Tokyo Electron Kyusyu Ltd.
Poster-2
D. Cong-Que
Tokyo Electron Kyushu Ltd.
Poster-3
T. Shiozawa
Tokyo Electron Kyushu Ltd.
