The 40th International Symposium on Dry Process (DPS) will be held November 13-15 in Japan. DPS is an international conference and held every year in Japan. And active discussions will be conducted on plasma etching and deposition process.
Tokyo Electron (TEL), which uses plasma technology for etching equipment and film forming equipment, will report five themes including one invited speak.
1, Thermal adsorption-assisted atomic layer etching of SiO2
2, Improvement of Local CD Uniformity for EUV Photoresist by Deposition/Trim Cyclic Process
3, A new method for high selective etching of Si3N4 and SiC with ion modification and chemical removal
4, Multiscale Simulation of Titanium PECVD Proces
5, Area Selective Process Technologies for Advanced Devices: Challenges and Opportunities
1, T.Mitsunari, N.Noro, T.Moriya (Tokyo Electron Technology Solutions Ltd.)
2, S.Morikita, S.Yoshimura, K.Ito (Tokyo Electron Miyagi Ltd.)
3, S.Kumakura, M.Tabata, M.Honda (Tokyo Electron Miyagi Ltd.)
4, K. Denpoh*1, P. Moroz*2 , T. Kato*1, M. Matsukuma*1
*1 Tokyo Electron Technology Solutions Ltd. *2 TEL Technology Center, America, LLC
5, G.Leusink (Tokyo Electron U.S. Holdings, Inc.)