2018 Symposia on VLSI Technology and Circuits

The topic at this time is 2018 Symposia on VLSI Technology and Circuits held in Hawaii from 6/18 to 6/22. Two symposiums on "Semiconductor Device and Process Technology" and "Semiconductor Circuit Technology" were held at the same venue, and engineers from all over the world participated in this symposium. The theme in this year was "Technology, Circuit, and Systems for Smart Living", so active discussion was held in various fields.
As remarkable presentations in the case of logic devices, there were the 7 nm generation platform technology adopting EUV, the 8 nm generation platform technology utilizing ArF immersion exposure + multi patterning, the second generation FinFET technologies, and NCFET as recently focused.
Also, AI and Neuromorphic were discussed in terms of a wide range of applications, device and process technology, and circuit technology.
In the memory-related field, there were presentations about the resistive memories related to Neuromorphic, scaling of STT-MRAM technologies and MRAM macros for embedded application, SOT-MRAM and VoCSM for lower power consumption and faster access beyond STT-MRAM performance.
It is said that the wall of scaling is approaching, but there are still many things you can do to improve performance, and realizing these will make you realize Smart Living.