Tokyo Electron to Begin Accepting Orders for NS300Z Next-generation Scrubbers
Tokyo Electron Limited (TEL) announced today that it will begin accepting orders in October 2014 for the NS300Z, a next-generation, high-performance scrubber.
The NS300Z is highly productive, delivering a throughput of up to 1,000 wafers per hour through its eight process chambers. Throughput has doubled while the quality, reliability and other market-proven features of the NS300+ HT have been retained.
New pre and post-transfer functions prevent cross-contamination during wafer transport, a significant issue with other wafer scrub cleaning processes.
Finally, the Atomized Spray 2 (AS2) and brushes from the previous system have been improved, enabling a wide range of scrubber cleaning processes with high productivity in leading-edge device manufacturing.
* Pre- and post-transfer functions: Functions to categorize wafer handling before and after cleaning.