Notification

Tokyo Electron (TEL) introduces a new feature of 300mm Plasma Treatment Reactor, Trias™ e+ SPAi

TEL Begins Accepting Orders for “Certas WING™” (High Throughput Gas Chemical Etch System)

Tokyo Electron Limited (TEL) Introduces New 300mm High Productivity Plasma ALD Nitride System, TELINDY PLUS™ IRad™ SA

TOKYO ELECTRON and TANAKA KIKINZOKU KOGYO succeeded the Joint Development of Innovative Recycling Process of Ruthenium Precursors. -Enabling the Reuse of Ruthenium Precursors Normally Discarded-

Tokyo Electron and Epson Conclude Joint Development Agreement for OLED Display Manufacturing Technology

Notice Concerning Payment of Interim Dividends from Retained Earnings

TEL Amends Dividend Policy and Revises Dividend Forecast

Announcement on Financial Forecast Revision

2Q FY2011 Financial Announcement

Establishment of Production Site in China

Establishment of a Research Association of Advanced Lithium Ion Capacitor (LIC) Technology

1Q FY2011 Financial Announcement

Announcement on Financial Forecast and Dividend Forecast Revision

Annual Report 2010 Issued

Tokyo Electron Introduces Probus-SiC™, a CVD Tool used in Epitaxial Film Growth on Silicon Carbide Substrates

Tokyo Electron Limited (TEL) and Ebara Corporation (Ebara) Mutually Agree on Joint Evaluation about Ruthenium Based Technology for Advanced Copper Interconnect

Notice Concerning Payment of Dividends from Surplus Earnings

Financial Review for the Year Ended March 31, 2010

Announcement on Financial Forecast Revision

Announcement on Financial Forecast Revision

Tokyo Electron Introduces the Tactras™ RLSA™ Etch, a New Etching System with Revolutionary Breakthrough Plasma Technology

Tokyo Electron Receives Intel's Preferred Quality Supplier Award

TEL Joins SEMATECH’s Lithography Program at UAlbany NanoCollege

Tokyo Electron Limited (TEL) Announces Joint Collaboration for Advanced Double-Patterning Technology

Tokyo Electron (TEL) and imec expand collaboration on EUVL