
In a heated LP-CVD (Chemical Vapor Deposition) or oxidation process, a very thin layer is deposited for transistor gate and surrounding of those structure fabrication. Also ALD technologies are adopted for further nano-scaling and deep trench pattern. While adopting the merits of the existing hot-wall system, Tokyo Electron offers a highly reliable system capable of high-speed heat processing.
Thermal Processing System
TELFORMULA
Thermal Processing System
TELINDY PLUS
Plasma-Enhanced Batch Thermal ALD System
TELINDY PLUS IRad
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