Surface Preparation Systems

What is surface preparation?

When wafers first arrive in a cleanroom, or after they have completed a process cycle, they undergo a cleaning procedure to remove foreign particles and/or contamination. Surface preparation systems use one of several methods to eliminate particles, such as brushes or sprays, depending on the type of cleaning required.

Products

Auto Wet Station
EXPEDIUS +

Auto Wet Station
EXPEDIUS -i

Gas Chemical Etch System
Certas WING

Single Wafer Cleaning System
CELLESTA +

Single Wafer Cleaning System
CELLESTA -i

Scrubber System
NS300+ HT

Scrubber System
NS300+

Single Wafer Cleaning System
ORION

Single Wafer Cryokinetic Cleaning System
ANTARES

Batch Spray System
ZETA

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EXPEDIUS, Certas WING and CELLESTA, ORION, ANTARES, ZETA are registered trademarks or trademarks of Tokyo Electron Group in Japan and/or other countries.

Products

  • Semiconductor Production Equipment
    • Thermal Processing
    • Coater/Developers
    • Etch Systems
    • Surface Preparation Systems
    • Single Wafer Deposition
    • Test Systems
    • Wafer Bonding/Debonding
    • SiC Epitaxial CVD System
    • Gas Cluster Ion Beam System
    • Advanced Packaging
  • Flat Panel Display Equipment
    • FPD Coater/Developers
    • FPD Etch/Ash Systems
  • Field Solutions
  • Electronic Components
  • Chip Making Process