What is surface preparation?

When wafers first arrive in a cleanroom, or after they have completed a process cycle, they undergo a cleaning procedure to remove foreign particles and/or contamination. Surface preparation systems use one of several methods to eliminate particles, such as brushes or sprays, depending on the type of cleaning required.

Products

Auto Wet Station
EXPEDIUS +

Auto Wet Station
EXPEDIUS -i

Gas Chemical Etch System
Certas WING

Single Wafer Cleaning System
CELLESTA +

Single Wafer Cleaning System
CELLESTA -i

Scrubber System
NS300+ HT

Scrubber System
NS300+

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EXPEDIUS, Certas WING and CELLESTA are registered trademarks or trademarks of Tokyo Electron Limited in Japan and/or other countries.