
Tokyo Electron's single-wafer deposition systems, especially, the latest 300mm platform Triase+, use cluster process modules that can be configured for a wide variety of applications. Among these systems TEL's representative process module, the Ti, TiN, and W metal CVD Series utilize the plug formation process and electrode process. The SPA Series extends its performance record by utilizing special hardware to respond to FEOL requirements as a low-temperature plasma processing system. In addition, the High-k CVD Series has been adopted for advanced gate stack processes, and is contributing to the acceleration of device speed and energy saving.
Single Wafer Plasma Treatment System
Triase+ SPAi
Single Wafer CVD System
Triase+ Ti/TiN
Single Wafer CVD System
Triase+ W
Single Wafer CVD System
Triase+ High-k CVD
© 1996-2013. Copyright Tokyo Electron Limited. All Rights Reserved.