What is an etch system?

Plasma etching occurs when a photoresist film is patterned onto the wafer, and the pattern is transferred to the film below. Within an etch chamber, highly reactive plasma gasses react with the wafer to remove the film where the pattern leaves it exposed. Once complete, the wafer has a dielectric film with a pattern that is ready to receive tungsten or copper, which serves as an interconnection to the next layer.

Products

Plasma Etch System
Telius SP

Plasma Etch System
UNITY Me

Plasma Etch System
Tactras

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