Dec 1, 2008

Tokyo Electron (TEL) Introduces a New 300mm Plasma Treatment Reactor, Trias™ SPAi

TOKYO-December 1st, 2008-- Tokyo Electron (TEL) today announced that the company will begin receiving orders for the Trias SPAi beginning January, 2009. The new chamber is a 300mm single-wafer tool for oxidation or nitridation.

TEL developed the Trias SPAi to reduce greenhouse gas emissions and improve COO through a smaller footprint and higher throughput. It is based on TELs popular Trias SPA, a low temperature plasma nitridation/oxidation process module installed at major DRAM, Flash and Logic customers worldwide. The Trias SPA creates a high-density, low-electron temperature plasma enabling damage-free processing in advanced radical oxidation and nitridation applications.

Takeshi Okubo, General Manager for TELs Single Wafer Deposition Business Unit, said, "The Trias SPAi demonstrates TELs commitment to delivering greener technology. We have worked diligently to reduce the tools electrical power consumption and CO2 emissions. Our design team has also reduced its footprint, thus reducing the environmental impact at our customers site. We were able to make these environmentally-conscious advances while still improving the tools overall productivity.

The tool will be used in a variety of applications, such as oxidation, nitridation, post treatment and refinement in the FEOL (Front end of Line) area.

*Trias is a trademark of Tokyo Electron Limited in Japan and/or other countries