2010

Nov 29, 2010 Tokyo Electron (TEL) introduces a new feature of 300mm Plasma Treatment Reactor, Trias™ e+ SPAi
Nov 29, 2010 TEL Begins Accepting Orders for “Certas WING™” (High Throughput Gas Chemical Etch System)
Nov 25, 2010 Tokyo Electron Limited (TEL) Introduces New 300mm High Productivity Plasma ALD Nitride System, TELINDY PLUS™ IRad™ SA
Nov 24, 2010 TOKYO ELECTRON and TANAKA KIKINZOKU KOGYO succeeded the Joint Development of Innovative Recycling Process of Ruthenium Precursors. -Enabling the Reuse of Ruthenium Precursors Normally Discarded-
Nov 11, 2010 Tokyo Electron and Epson Conclude Joint Development Agreement for OLED Display Manufacturing Technology
Nov 2, 2010 TEL Amends Dividend Policy and Revises Dividend Forecast
Nov 2, 2010 Notice Concerning Payment of Interim Dividends from Retained Earnings
Nov 2, 2010 Announcement on Financial Forecast Revision
Nov 2, 2010 TEL Announces Changes in the Important Personnel
Nov 2, 2010 2Q FY2011 Financial Announcement
Oct 20, 2010 Establishment of Production Site in China
Sep 17, 2010 Tokyo Electron Announces Organizational Changes
Sep 7, 2010 Establishment of a Research Association of Advanced Lithium Ion Capacitor (LIC) Technology
Jul 30, 2010 TEL Announces Organizational and Personnel Changes
Jul 30, 2010 1Q FY2011 Financial Announcement
Jul 30, 2010 Announcement on Financial Forecast and Dividend Forecast Revision
Jun 18, 2010 TEL Announces Personnel Changes
Jun 15, 2010 Tokyo Electron Introduces Probus-SiC™, a CVD Tool used in Epitaxial Film Growth on Silicon Carbide Substrates
Jun 7, 2010 Tokyo Electron Limited (TEL) and Ebara Corporation (Ebara) Mutually Agree on Joint Evaluation about Ruthenium Based Technology for Advanced Copper Interconnect
May 27, 2010 Notice of fiscal year 2010 annual general meeting of shareholders
May 12, 2010 Announcement for Executive Management,Important Personnel and Organizational Changes
May 12, 2010 Notice Concerning Payment of Dividends from Surplus Earnings
May 12, 2010 Financial Review for the Year Ended March 31, 2010
Apr 27, 2010 Announcement on Financial Forecast Revision
Mar 25, 2010 Announcement on changes in CEO, corporate organization, and important personnel
Mar 25, 2010 Announcement on Establishment of Subsidiary
Mar 25, 2010 Announcement on Financial Forecast Revision
Mar 25, 2010 Tokyo Electron Introduces the Tactras™ RLSA™ Etch, a New Etching System with Revolutionary Breakthrough Plasma Technology
Mar 16, 2010 Tokyo Electron Receives Intel's Preferred Quality Supplier Award
Feb 24, 2010 TEL Joins SEMATECH’s Lithography Program at UAlbany NanoCollege
Feb 18, 2010 Tokyo Electron Limited (TEL) Announces Joint Collaboration for Advanced Double-Patterning Technology
Feb 16, 2010 Tokyo Electron (TEL) and imec expand collaboration on EUVL

News

  • 2014
  • 2013
  • 2012
  • 2011
  • 2010
  • 2009
  • 2008
  • 2007
  • 2006
  • 2005
  • 2004
  • 2003
  • 2002
  • 2001
  • Shows & Events
  • Request News