Tokyo, JAPAN- November 29, 2007 - Tokyo Electron Limited (TEL) and Integrated Materials, Inc. (IMI) announced plans to jointly promote their most advanced furnace systems and SiFusion furnace consumables.
Under this agreement, TEL designates IMI as a strategic supplier making IMI products as its preferred furnace consumables and has an exclusive right to use IMIs SiFusion 100% pure poly silicon furnace consumables for LPCVD Poly applications. It is expected that IMIs SiFusion products will enable customer to improve TCO (Total Cost of Ownership) by reducing preventive maintenance (PM) cycles, and cleaning costs, while increasing furnace availability. IMIs proprietary SiFusionTM surfaces allow TEL furnace systems to accumulate 5 to 20 times more Poly LPCVD film deposition before a PM.
TEL is always interested in adopting a new technology that will benefit customers. said Hiroshi Takenaka, Corporate Director of TEL and Senior Vice President and General Manager of Thermal Processing System Business Unit. We expect this alliance will provide better overall furnace system performance to customers at lower overall cost of ownership.
Daniel Rubin, President and CEO of IMI commented IMI is the first and the only company that has technologies to manufacture production proven furnace consumables with 100% pure poly silicon material. Together with TELs most advanced furnace systems, we expect to provide high purity, low maintenance, and improved cost of ownership furnace solutions to IC manufacturers worldwide.
TEL and IMI believes this alliance will provide customers with value added furnace solutions and both parties are currently discussing expansion of the alliance for other applications.
About Integrated Materials, Inc.
With its patented SiFusion technology, Integrated Materials, Inc., Sunnyvale, Calif., is the first and only company to perfect the poly silicon furnace fixtures solution sought for years by the semiconductor industry. Integrated Materials unique family of SiFusionTM poly silicon furnaceware eclipses traditional quartz and silicon carbide consumables by its ability to increase yield by reducing particles in LPCVD as well as trace metal contamination and slip reduction in high temperature processes. SiFusionTM furnaceware improves productivity and reduces cost with the significant reduction of routine cleaning. www.sifusion.com
Contact: TEL Thermal Processing Systems Business Unit
Shingo Tada: +81-3-5561-7381
Contact: Integrated Materials, Inc.
Ilsong Lee(ex.242) email@example.com
Atsushi Kishida (ex.232)