TELINDY IRad, based on the design of the innovative TELINDY batch reactor, handles high volume manufacturing of advanced plasma enhanced chemical vapor deposition(PECVD) nitride and oxide films on 300mm wafers. The IRad in-situ plasma source allows for lower temperature film deposition, which is required for advanced sub-45nm technology.

• Low temperature PECVD oxide
• Low temperature PECVD nitride
• Molecular layer oxide deposition
• Molecular layer nitride deposition

• High speed robotics
• Advanced wafer cooling system
• Optimized gas delivery designs
• In-situ plasma generation

• *TELINDY is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.
• *IRad is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.
• *IRad= In-situ Radical assisted deposition