With a notable 58% share in the batch furnace market, TEL is world-renowned for manufacturing the most reliable vertical thermal processing systems. The Alpha-303i, TEL's 300mm large batch thermal processing solution, leads the industry with powerful process capabilities and the smallest footprint on the market. TEL's latest entry into thermal processing is the 300mm TELiNDY, which provides the next evolutionary step in thermal processing.

In a heated LP-CVD (Chemical Vapor Deposition) or oxidation process, a very thin layer of dielectric material is deposited onto the wafer surface. This dielectric layer is used as the insulating material between transistors. In many areas of the wafer fabrication process, wafers are heated to extremely high temperatures in a short amount of time, in order to improve the functionality of the transistor.