With the capability of both frontside and backside cleaning, the NS300+ doubles the throughput with an 8-chamber tool, while maintaining a footprint that is comparable to the previous 4-chamber model. Employing TELs market-leading coater/developer CLEAN TRACK LITHIUS Pro technology, the NS300+ offers a highly reliable wafer processing platform. TELs competitive offering provides low cost of ownership with high throughput, 42% less water consumption and a 51% reduction in electricity usage.

The NS300+ enables higher process yields with new technology designed to remove defects from the front side, back side and bevel of the wafer. With continued scaling of device geometries, bevel defects are increasingly identified as yield limiters when they are displaced from the bevel to the active area of the wafer. To address this issue, the proven atomized spray and brush technology from the previous system has been enhanced with a mechanical brush and chemical-assisted bevel cleaning.

• *CLEAN TRACK LITHIUS Pro is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.