EXPEDIUS -i, with a throughput of 1,000 wph, is TEL's latest auto wet station offering for high production batch wafer surface preparation. Production has been enhanced through new development in tank and dryer design and new process capability to achieve higher process throughput. Process applications include pre-diffusion and pre-CVD cleans, post-etching cleans, wet etching, and rapid resist stripping.

• Pre-diffusion and pre-CVD washing
• Post-etching washing
• Wet etching
• Resist stripping
• Reworking

• Transport system with maximum throughput of 1,000 wafers per hour
• Rapid resist stripping
• One-bath type processing tank compatible with miniaturized processing
• New SD2 dryers
• Next-generation device that extends the life of batch processing equipment with an eye towards 45 nm and smaller geometries

• *EXPEDIUS is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.