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CLEAN TRACK LITHIUS Pro V / LITHIUS Pro V-i

CLEAN TRACK LITHIUS

Applications

  • Lithography process (ArF Immersion, ArF, KrF, i-line)

Features

  • This is the new platform for high productivity improvement from
    LITHIUS Pro
  • Tool throughput will be maximum 250wph capable in future
    (200wph capability with future upgradeability to 250wph)
  • Optimized integration with the exposure tool for maximizing litho cell throughput (Maximized litho cell throughput as result of optimized integration with exposure tool)
  • OEE Improvement as a litho-cell including the exposure tool(Improved litho cell OEE including exposure tool)
  • Drastically reduced chemical consumption (Significantly reduced chemical consumption)
  • *CLEAN TRACK, LITHIUS Pro are registered trademarks or trademarks of Tokyo Electron Limited in Japan and other countries.

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