The CLEAN TRACK LITHIUS Pro is a coater/developer for 32nm and beyond technology nodes. Offering a significantly decreased footprint and enhanced productivity, this new platform requires less cleanroom floorspace than current generation coater/developers. The LITHIUS Pro incorporates innovative TEL technologies which exemplify the core concepts of improved OEE(Overall Equipment Efficiency)and lower CoO(cost of ownership). The LITHIUS Pro is also capable of supporting advanced immersion lithography through innovative processes and modules(LITHIUS Pro-i). The platform can also be configured with multiple integrated metrology modules for advanced process control solutions.

• Lithography Process (ArF Immersion, ArF, KrF, i-line)

• 180WPH (Wafer per Hour) throughput
• Optimized integration with exposure tool for maximize litho cell throughput
• OEE Improvement as a litho-cell including the exposure tool
• Dramatically reduced chemical consumption
• Full system integration of measurement & inspection tools
• Standard core network solution, Ingenio
• LITHIUS Pro-i developed for Immersion technology

• *CLEAN TRACK, LITHIUS Pro and Ingenio are registered trademarks or trademarks of Tokyo Electron Limited in Japan and other countries.
• *Please refer to P17 for Timbre's optical measurement system.