TEL's advanced Clean Track coater/developer systems are world-renowned for superior performance and reliability. Leading the industry, we deliver innovative track systems for 200mm and 300mm high volume production and 193nm processing and beyond. Based on the same platform used for lithographic coating and developing, we also offer spin-on-dielectric solutions with in-line cure processing.

In a process similar to creating photographic prints, a microscopic circuitry pattern is projected onto the wafer that has been coated with a light-sensitive chemical. Like camera film, the wafer is then developed, leaving behind a stenciled pattern of photoresist to define the areas on the wafer that will be affected by the remaining steps in the transistor cycle. The light-sensitive material, called resist, is deposited by coater/developers. This process is repeated-and a new circuitry pattern is used-each time another layer of the chip is built.