Tokyo Electron Limited (TEL) announced today that it will release its new 300mm high productivity coater/developer, CLEAN TRACK LITHIUS Pro V in the spring of 2009. The LITHIUS Pro Ｖ is the latest coater/developer in the market-leading CLEAN TRACK LITHIUS series.



TEL developed the LITHIUS Pro V to achieve dramatically higher productivity and reliability to meet the most aggressive litho-cell throughput requirements. The new system incorporates innovations from TELs industry-proven coaters/developers, the CLEAN TRACK ACT and CLEAN TRACK LITHIUS series, which are used in high volume production at leading IC manufacturers worldwide.



LITHIUS Pro V increases wafer per day litho-cell output, improves overall equipment efficiency and significantly reduces chemical / electrical usage to provide greater value to customers. The system also achieves higher throughput, exceeding requirements for todays most productive litho-cells. Finally, the new LITHIUS Pro V meets industry requirements for versatile lithography equipment capable of leading edge processes, including double patterning.



The introduction of the CLEAN TRACK LITHIUS Pro V addresses our customers needs for increased productivity, higher reliability and compact size while incorporating all of the advanced technological capabilities of TEL's proven CLEAN TRACK LITHIUS Pro platform," said Ken Sato, president of Tokyo Electron Limited.



TEL remains dedicated to providing the most advanced coaters/developers to meet our customers current and future technology and productivity requirements.