TOKYO -- Tokyo Electron (TEL), the world leader in dielectric etch, announced today the release of UNITY® LS, equipped with TEL's award-winning DRM chamber, a MERIE style capacitively coupled plasma source. The new system supports all dielectric applications, including contact, dual damascene and low-k.



TEL has been working with 200mm technology end users to develop a low-cost, standard configuration equipment solution that provides cost-savings through a shortened warranty period and simplified start-up support.

"There is currently a very high demand for reasonably priced equipment in the 200mm etch market. The UNITY LS was designed as an alternative solution for customers looking for used 200mm TEL UNITY® IIe DRM systems. Customers can avoid chamber reconfigurations, component level modifications, software upgrades or patches, and other unknown risks associated with typical used equipment purchases," remarked Masa Tatewaki, Global Service Manager, TEL Etch Systems Business Planning Department.



Featuring a new modular platform with up to four DRM chambers, TEL's UNITY LS plasma etch system maintains the industry benchmark for productivity and reliability. The system also offers reduced CoO through easier maintenance, a reduced number of parts and longer part life between chamber cleans.



While many customers are using the DRM chamber for advanced sub 90nm applications, the UNITY LS can also support older applications, up to 35μm. The tool may easily be converted to a 150mm system for customers who plan to utilize a conversion kit.



The UNITY LS etch system automatically comes with access to TEL's award-winning customer service, including field service support, technical training, process engineering, software modifications, a limited warranty and website support services at www.TELcustomer.com.