Austin, TX-Tokyo Electron (TEL), world-leader in thermal processing systems, announced today that the TELINDY™ is now in full-scale production at major IDMs. TEL's newest batch thermal reactor addresses emerging trends and requirements for 65-nm technologies extending to 45nm and beyond.

The TELINDY offers up to a 50% reduction in overhead time when compared to typical large batch platforms. This technology-enabling platform has been brought to mainstream through careful implementation of hardware elements that increase the productivity by almost 80%, thereby boosting the system's efficiency significantly. The TELINDY also achieves reduced CoO with a larger, 125-wafer load size and a comparably small footprint.

TELINDY's unique reactor design enables sequential processing of multiple film stacks with field-proven in-situ clean capabilities, greatly improving tool availability and CoO for a set of films that may otherwise require processing on multiple toolsets. The TELINDY can process oxide, nitride and additional advanced films, such as LPRO (Low Pressure Radical Oxidation).

"TELINDY offers a revolutionary platform that integrates the ability to process leading thermal applications with in-situ clean," said Hiroshi Takenaka, General Manager of TEL's Thermal Processing Business Unit. "Proven as a technology enabler, the TELINDY is rapidly being adopted into HVM by major IDMs."

TEL continues to push the envelope of thermal processing capabilities through improved and more efficient reactors that address the technical requirements faced by semiconductor manufacturers in their efforts to develop sub-45nm nodes.