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Jul 7, 2005 Timbre Technologies, A TEL Company, Introduces Fastest Library Generation TechnologySanta Clara, CA-July 7, 2005- Timbre Technologies, Inc., a TEL company, announces the release of their next generation Optical Digital Profilometry (ODP) metrology product, TeraGen 2.5. The new product offers the fastest library generation time combined with exceptional precision. Using TeraGen 2.5's Turbo technology, library generation time is reduced by a factor of five times or more, and even complex Turbo libraries can be typically generated in less than one hour. In addition, parameter volume is greatly expanded, resolution is improved, and library file size is reduced for easy management. Turbo libraries provide a significant reduction in time-to-results, continuing the trend of ODP libraries as the fastest and easiest precision metrology process, ideal for production environments. TeraGen 2.5 supports Timbre's Smart Spectra technology, which assures the highest modeling accuracy and productivity, and brings practicality to the generation of even the toughest 3D libraries for monitoring processes, such as contact and via . Furthermore, TeraGen 2.5's user interface has greater flexibility and improved productivity, so that users can quickly implement new applications into production with high confidence in the integrity of metrology performance. "TeraGen 2.5 is a breakthrough release in the continuum of our advanced product roadmap. This latest release of TeraGen again delivers a quantum leap in ODP technology, said Alan Nolet, Timbre president. " These enhancements are provided to our customers as part of our drive to add value to the results customers achieve with our technology." Timbre's Optical Digital Profilometry (ODP) is a breakthrough metrology technology using broadband light to provide non-destructive, high-speed, cross-sectional profiles, including user-selected CDs, profile parameters, and thickness measurements for a wide range of applications. ODP has quickly become the most widely accepted optical approach for process improvement, exceeding the ITRS metrology precision roadmap for many future nodes. |
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