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Nov 28, 2002 TEL Releases Optical CD Measurement Module for Use in Coater/DevelopersTokyo Electron Limited announced today that the company has commenced sales of an optical critical dimension (OCD) measurement module for use in coater/developers. As wafer diameters have increased, processing and inspection have been automated at an increasing pace. Furthermore, the need to integrate both of these aspects is growing quickly. In particular, business opportunities exist in manufacturing SoC (System on a Chip) devices, where short turnaround time (TAT) is essential, by working on conducting inspections in real time, and quickly bringing products to market. As miniaturization continues in lithography processes, the management of CDs (critical dimension) in particular is even more important, meaning the need is increasing for commercialization of a CD measurement module that can monitor CD in real time, and be built into processing systems. The core of the OCD module is Optical Digital ProfilometryTM, or ODPTM, which was developed by Timbre Technologies, Inc., a U.S. subsidiary of TEL. This technology outputs CDs by performing revolutionary high-speed computations on spectral changes in reflected light. TEL has combined ODP with a spectroscopic reflectometer (INTEGRA CCD-i) supplied from a manufacturer of measurement instruments, and released it commercially as an OCD module for use in processing systems. By building the OCD module into coater/developers, CDs can be monitored in real time, enabling integrated management, as well as rapid response when problems occur. The system also reduces the number of non-production wafers, and eliminates the need for moving wafers to an off-line measurement apparatus after the lithography process is complete, contributing to the overall shortening of the lithography system's TAT, and to improved productivity. In addition, the company will integrate the unit with its IngenioTM series of Advanced Process Control (APC) systems in the future, offering a comprehensive lithography solution, including the related processes of exposure and etching, to customers. The OCD module, currently available for use with TEL's CLEAN TRACK ACT® series of coater/developers, is slated to commence shipping at the end of March 2003. The unit will also support the next generation coater/developer, the CLEAN TRACK LITHIUSTM. |
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